Nurhafizah, Abu Talip and Hayashi, Tatsuya and Taniguchi, Jun and Hiwasa, Shin (2015) Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography. Japanese Journal of Applied Physics, 54 (6S1). pp. 1-7. ISSN 0021-4922. (Published)
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In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the complete filling of resin in a high-aspect-ratio RAF-ARS replica mold during UV-NIL, degrades its fluorinated components and consequently shortens its lifetime. In this paper, we propose a technique for the lifetime amelioration of RAF-ARS replica molds by partial-filling UV-NIL. Complete-filling UV-NIL was also executed for comparison. We also examined the effects of the filling ratio on an RAF-ARS replica mold. Using the partial-filling UV-NIL technique, we successfully prolonged the lifetime of an RAF-ARS replica mold up to the 100th imprint, compared with the 75th imprint in the case of complete-filling UV-NIL.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Ultraviolet nanoimprint lithography (UV-NIL); Partial-filling UV-NIL technique |
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
| Faculty/Division: | Faculty of Electrical & Electronic Engineering |
| Depositing User: | Mrs. Neng Sury Sulaiman |
| Date Deposited: | 11 Feb 2016 07:49 |
| Last Modified: | 28 Jun 2018 01:07 |
| URI: | http://umpir.ump.edu.my/id/eprint/11884 |
| Download Statistic: | View Download Statistics |
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