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Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system

Ng, K. H. and Cheng, C. K. (2016) Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system. In: International Conference on Catalysis 2016 (ICAT 2016), 20-21 September 2016 , Grand Bluewave Hotel, Johor Bahru. p. 1.. (Unpublished)

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Abstract

The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level.

Item Type: Conference or Workshop Item (Lecture)
Uncontrolled Keywords: Palm oil mill effluent (POME); UV/ZnO system
Subjects: T Technology > TP Chemical technology
Faculty/Division: Faculty of Chemical & Natural Resources Engineering
Depositing User: Ms. Siti Nur Sahidah Ahmad
Date Deposited: 29 Jun 2018 02:10
Last Modified: 29 Jun 2018 02:10
URI: http://umpir.ump.edu.my/id/eprint/17069
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