No default citation style available for Eprints
|
Pdf
09166887.pdf Download (320kB) | Preview |
DOI/Official URL: https://ieeexplore.ieee.org/document/9166887
Abstract
This research paper presents the effect of working temperature on the ION, IOFF and ION/IOFF ratio of gate all around nanowire TFET. The (Silvaco) simulation tool has been used to investigate the temperature characteristics of a transistor. The working temperature range of this study is from -50 to 150 step-up 25 oC. The final results indicate that the negative effects of increasing working temperature of gate all around nanowire TFET due to decreasing of the ION/IOFF ratio. Hence, the results for ION/IOFF ratio vs. working temperature characteristics may lead to the use of TFET in electronic circuits with lowest possible working temperature to obtain higher ION/IOFF ratio.
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Uncontrolled Keywords: | Nanowire; Transistor; Temperature; TFET; OFF; ON |
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
| Faculty/Division: | Faculty of Electrical and Electronic Engineering Technology |
| Depositing User: | Dr. Mohammed Nazmus Shakib |
| Date Deposited: | 10 Dec 2020 08:09 |
| Last Modified: | 10 Dec 2020 08:09 |
| URI: | http://umpir.ump.edu.my/id/eprint/30155 |
| Download Statistic: | View Download Statistics |
Actions (login required)
 |
View Item |